Equipments

Magnetron Sputtering System with DC and RF power source , Four guns are in confocal geometry.  

Split Tube Furnace  with a PID controller , with a tuning of temperature up to 1200 degree centigrade.

Spin Coater ,accommodate wafers upto 200mm diameter with a maximum rotational speed of 12000 RPM.

Three Zone Chemical Vapour Deposition system. Maximum temperature of each zone is up to 1200 degree centigrade

Coherent Compex 205: UV Excimer Laser (248 nm) and Deposition Chamber 

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Keithley 4200 SCS semiconductor parameter analyzer with 2 SMUs/PMUs/CVUs.

JANIS probe station (model no: ST500-UHT-1-(4CX)) with temperature controller.

Cypher S AFM equipped with cAFM, PFM, MFM, EFM, KPFM and nanolithography, advanced modes.